Dear colleague,

Plasma Science and Technology (PST) journal, the sole English journal in the field of plasma physics in China, is co-published by the Institute of Plasma Physics of the Chinese Academy of Sciences (ASIPP) and IOP Publishing. High quality original articles and authoritative reviews that focus on plasma science will be accepted after international peer review. Special issues related to this field are also published at times.

Prof. Yunfeng LIANG

Editor-in-Chief, Plasma Sci. Technol.

• Volume 25, Issue 10, October 2023

•  

  Letter

  A laser-produced plasma source based on thin-film Gd targets for next-generation extreme ultraviolet lithography

  Xiao CHEN (陈笑), Yao LI (黎遥), Jianbo HOU (侯鉴波), Zhe ZHANG (张哲), Xianyang LU (陆显扬), Yu YAN (严羽), Liang HE (何亮) and Yongbing XU (徐永兵)
  Plasma Sci. Technol. 2023, 25 (10): 102001; doi: 10.1088/2058-6272/acd61e

  Abstract |  PDF

•  

  2022 National Conference on High Voltage and Discharge Plasmas

  The effect of pulse voltage rise rate on the polypropylene surface hydrophilic modification by ns pulsed nitrogen DBD

  Feng LIU (刘峰), Shuhao LI (李舒豪), Yulei ZHAO (赵昱雷), Shakeel AKRAM, Li ZHANG (张丽) and Zhi FANG (方志)
  Plasma Sci. Technol. 2023, 25 (10): 104001; doi: 10.1088/2058-6272/acd529

  Abstract |  PDF

• Comparative study on the degradation of phenol by a high-voltage pulsed discharge above a liquid surface and under a liquid surface

  Quanfa ZHAO (赵泉发), Haixia WU (武海霞), Wang SHEN (沈旺), Xiao HAN (韩霄), Bin ZHENG (郑镔) and Jiawei FAN (樊佳炜)
  Plasma Sci. Technol. 2023, 25 (10): 104002; doi: 10.1088/2058-6272/accf66

  Abstract |  PDF

• Room-temperature degradation of o-xylene in simulated air using an online-regenerable plasma-catalysis reactor with low amounts of nanosized noble metals on Co₃O₄

  Shucheng DI (狄书成), Jiacheng XU (徐家成), Shuiliang YAO (姚水良), Jing LI (李晶), Zuliang WU (吴祖良), Erhao GAO (高尔豪), Jiali ZHU (朱佳丽), Lianxin DAI (戴连欣), Weihua LIU (刘卫华), Buhe ZHANG (张补河) and Junwei ZHANG (张峻维)
  Plasma Sci. Technol. 2023, 25 (10): 104003; doi: 10.1088/2058-6272/acde32

  Abstract |  PDF

• Enhanced surface-insulating performance of EP composites by doping plasma-fluorinated ZnO nanofiller

  Qijun DUAN (段祺君), Yanze SONG (宋岩泽), Shuai SHAO (邵帅), Guohua YIN (尹国华), Haoou RUAN (阮浩鸥) and Qing XIE (谢庆)
  Plasma Sci. Technol. 2023, 25 (10): 104004; doi: 10.1088/2058-6272/acdb53

  Abstract |  PDF

•  

  Papers

  Magnetically Confined Plasma

  Closed corner divertor with B × ∇B away from the divertor: a promising divertor scenario for tokamak power exhaust

  Guosheng XU (徐国盛), Guozhang JIA (贾国章), Genfan DING (丁根凡), Yuqiang TAO (陶余强), Lingyi MENG (孟令义), Lin YU (余林), Liang WANG (王亮) and Jianbin LIU (刘建斌)
  Plasma Sci. Technol. 2023, 25 (10): 105101; doi: 10.1088/2058-6272/acd89c

  Abstract |  PDF

•  

  Low Temperature Plasma

  Effect of gas flow on the nanoparticles transport in dusty acetylene plasmas

  Xiangmei LIU (刘相梅), Wenjing LIU (刘文静), Xi ZHANG (张茜), Xiaotian DONG (董晓天) and Shuxia ZHAO (赵书霞)
  Plasma Sci. Technol. 2023, 25 (10): 105401; doi: 10.1088/2058-6272/acd361

  Abstract |  PDF

• A homogeneous atmospheric pressure air plasma in a 10 mm gap based on a three-electrode configuration

  Zhiyu LI (李志宇), Dawei LIU (刘大伟), Xinpei LU (卢新培) and Lanlan NIE (聂兰兰)
  Plasma Sci. Technol. 2023, 25 (10): 105402; doi: 10.1088/2058-6272/acd16c

  Abstract |  PDF

•  

  Plasma Technology

  Pulsed gas–liquid discharge plasma catalytic degradation of bisphenol A over graphene/CdS: process parameters optimization and O₃ activation mechanism analysis

  Nan JIANG (姜楠), Xuechuan LI (李学川), Ju LI (李举)1, Jie LI (李杰), Bing LIAO (廖兵), Bangfa PENG (彭邦发) and Guo LIU (刘国)
  Plasma Sci. Technol. 2023, 25 (10): 105501; doi: 10.1088/2058-6272/acbde5

  Abstract |  PDF

• Etching characteristics and surface modification of InGaSnO thin films under Cl₂/Ar plasma

  Young-Hee JOO, Jae-Won CHOI, Bo HOU, Hyuck-In KWON, Doo-Seung UM and Chang-Il KIM
  Plasma Sci. Technol. 2023, 25 (10): 105502; doi: 10.1088/2058-6272/acd588

  Abstract |  PDF

• Enhancing surface adhesion of polytetrafluoroethylene induced by two-step in-situ treatment with radiofrequency capacitively coupled Ar/Ar+CH₄+NH₃ plasma

  Manting LU (卢曼婷), Yi HE (何弈), Xue LIU (刘学), Jiamin HUANG (黄嘉敏), Jiawei ZHANG (张佳伟), Xiaoping MA (马晓萍) and Yu XIN (辛煜)
  Plasma Sci. Technol. 2023, 25 (10): 105503; doi: 10.1088/2058-6272/acd528

  Abstract |  PDF

• Endurance-test and theoretical prediction of a rare earth nanocathode for the applied field magnetoplasmadynamic thruster

  Ge WANG (王戈), Yong LI (李永), Cheng ZHOU (周成), Yanming WEI (魏延明), Chuncai KONG (孔春才), Xuecheng ZHENG (郑学程), Xinwei ZHANG (张心霨), Zhimao YANG (杨志懋), Jinxing ZHENG (郑金星), Yuntian CONG (丛云天) and Baojun WANG (王宝军)
  Plasma Sci. Technol. 2023, 25 (10): 104005; doi: 10.1088/2058-6272/aceac6

  Abstract |  PDF

•  

  Fusion Engineering

  3D fluid model analysis on the generation of negative hydrogen ions for negative ion source of NBI

  Siyu XING (邢思雨), Fei GAO (高飞), Yuru ZHANG (张钰如), Yingjie WANG (王英杰), Guangjiu LEI (雷光玖) and Younian WANG (王友年)
  Plasma Sci. Technol. 2023, 25 (10): 105601; doi: 10.1088/2058-6272/accfee

  Abstract |  PDF

● Fast publication

● Professional handling

● High visibility

● High quality

● Online functionality

Contact us at pst@ipp.ac.cn

Journal web: iopscience.org/pst